This Recommended Practice (RP) provides a uniform method and basis for defining the rates of deposition of nonvolatile residue (NVR) and other forms of molecular contamination on surfaces in cleanrooms.

BACKGROUND AND PURPOSE

Cleanrooms are designed to protect products from contaminants that affect the performance of those products.

Molecular contaminants, introduced by the air that enters the cleanroom or by emissions from items within the cleanroom, are deposited onto surfaces in the form of thin films or droplets; these types of deposits are called NVR. The molecular contaminants are typically transported in the air as gases or as liquid aerosols. This type of contamination is frequently referred to as airborne molecular contamination or AMC.

This RP is for use in defining the cleanroom environment and may be used in a contract with the agreement of customer and supplier. In addition, this RP is intended to complement standards on allowable NVR and molecular contaminants on products, such as IEST-STD-CC1246.